Mechanismofphotocatalysis-assistedchemicalmechanicalpolishingofCVDsinglecrystaldiamond

Jianhui Zhu; Yanjun Zhao; Zewei Yuan; Haiyang Du; Yuchun Xu

doi:10.1080/26941112.2024.2433955

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Mechanismofphotocatalysis-assistedchemicalmechanicalpolishingofCVDsinglecrystaldiamond

Research Article | Updated：2025-12-10

- Mechanismofphotocatalysis-assistedchemicalmechanicalpolishingofCVDsinglecrystaldiamond
- Mechanism of photocatalysis-assisted chemical mechanical polishing of CVD single crystal diamond
- Functional Diamond 2025年5卷第1期
- Affiliations：
  
  1. a State Key Laboratory for High Performance Tools Zhengzhou Research Institute for Abrasives & Grinding Co. LTD Zhengzhou China
  2. b State Key Laboratory of High Performance Precision Manufacturing Dalian University of Technology
  3. a State Key Laboratory for High Performance Tools Zhengzhou Research Institute for Abrasives & Grinding Co. LTD
  4. c School of Mechanical Engineering Shenyang University of Technology
- Author bio：
- Funds：
- DOI：10.1080/26941112.2024.2433955
  中图分类号：
- 网络出版：2024-12-09，
  
  纸质出版：2024-12-09
- Accepted：
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Jianhui Zhu, Yanjun Zhao, Zewei Yuan, 等. Mechanismofphotocatalysis-assistedchemicalmechanicalpolishingofCVDsinglecrystaldiamond[J]. Functional Diamond, 2025,5(1).

Jianhui Zhu, Yanjun Zhao, Zewei Yuan, et al. Mechanism of photocatalysis-assisted chemical mechanical polishing of CVD single crystal diamond[J]. 2025, 5(1).
Jianhui Zhu, Yanjun Zhao, Zewei Yuan, 等. Mechanismofphotocatalysis-assistedchemicalmechanicalpolishingofCVDsinglecrystaldiamond[J]. Functional Diamond, 2025,5(1). DOI： 10.1080/26941112.2024.2433955.

Jianhui Zhu, Yanjun Zhao, Zewei Yuan, et al. Mechanism of photocatalysis-assisted chemical mechanical polishing of CVD single crystal diamond[J]. 2025, 5(1). DOI： 10.1080/26941112.2024.2433955.

摘要

Abstract

Chemical vapor deposition (CVD) single-crystal diamond has very promising applications in the domains of semiconductors

optical windows

and heat conductivity. However

polishing diamonds is difficult due to their extreme hardness and chemical stability. This study presents a photo catalysis-assisted chemical mechanical polishing (PCMP) approach for creating an ultra-smooth surface on CVD single-crystal diamond. The study used X-ray photoelectron spectroscopy to analyze surface information for the investigation of the PCMP mechanism. The analysis and experimental results reveal that the material removal processes for lapping with larger and smaller abrasives vary. Mechanical action during the PCMP stage enhances the chemical intereaction between carbon and hydroxyl radicals. Diamond carbons are oxidized by hydroxyl radicals ·OH formed on titanium dioxide particles in forms of “C-O”

“C = O” and “O = C-OH”.

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