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Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond
Articles | Updated:2021-02-19
    • Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond

    • Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond

    • Functional Diamond   2021年1卷第1期 页码:47-62
    • DOI:10.1080/26941112.2020.1869511    

      中图分类号:
    • 网络首发:2021-02-19

      纸质出版:2021

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  • Guoyang Shu, Bing Dai, Andrey Bolshakov, 等. Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond[J]. Functional Diamond, 2021,1(1):47-62. DOI: 10.1080/26941112.2020.1869511.

    Guoyang Shu, Bing Dai, Andrey Bolshakov, et al. Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond[J]. Functional Diamond2021, 1(1): 47-62. DOI: 10.1080/26941112.2020.1869511.

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