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Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond
Articles | Updated:2021-02-19
    • Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond

    • Functional Diamond   Vol. 1, Issue 1, Pages: 47-62(2021)
    • DOI:10.1080/26941112.2020.1869511    

      CLC:
    • Online First:19 February 2021

      Published:2021

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  • Guoyang Shu, Bing Dai, Andrey Bolshakov, et al. Coessential-connection by microwave plasma chemical vapor deposition: a common process towards wafer scale single crystal diamond[J]. Functional Diamond2021, 1(1): 47-62. DOI: 10.1080/26941112.2020.1869511.

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